- Laser annealing system
- Excimer laser annealing system
- DPSS laser annealing system
- Laser patterning system
- Precision Positioning machine XY Stage
- Control system for film coating
- Motion controller
- Servo driver
- Linear motor
Top >> Products >> Products for FPD/PV/OLED processing >> Laser annealing system >> Excimer laser annealing system
The best suitable system to the mass production of low temperature poly-silicon TFT's.
This ELA series that pursued modulization with the laser and optic system made by own company.
The line-up of the system is up to 730x920 mm size substrate as a standard.
The ELA-TW series is the mass production system of the high throughput correspondence that installed the total systems including 2 sets of the Excimer lasers and optics.
Feature
ELA Series Specifications
| Items/Series | ELA7600 | ELA9700 | ELA1211 | ELA1312 |
|---|---|---|---|---|
| Substrate Size | 600x750mm | 730x920mm | 1100x1250mm | 1200x1300mm |
| Beam Size | 200mm,300mm,320mm,365mm | |||
| Laser Output | 200W,240W,300W | |||
| Pulse Energy | 666mJ,800mJ,1000mJ | |||
| Repetition Rate | 300Hz | |||
| Process Atmosphere | N2/air | |||
| Process Temperature | R.T. | |||
| Energy Density | Max. 450mJ/cm2 | |||
| Beam Length | 100~200mm | 200~300mm | 240~320mm | 365mm |
| Beam Width | 0.55~1.5mm | 0.35~0.6mm | 0.35~0.6mm | 0.35~0.6mm |
Sumitomo Heavy Industries, Ltd. Sales Department Group 2, Mechatronics Division
